开尔文探针原子力显微镜在CdTe多晶薄膜研究中的应用

The Application of Kelvin Probe Force Microscope in CdTe Polycrystalline Semiconductor Thin Films

  • 摘要: 开尔文探针原子力显微镜(KPFM)采用开尔文(Kelvin)方法来测量探针和样品间的电势差,是一种基于扫描探针原子力显微镜的半导体薄膜样品表面功函数(表面电势)测量方法,其可以在测试样品表面形貌的同时获得与形貌相对应位置的表面功函数分布图。使用KPFM测试碲化隔多晶薄膜样品退火前后的表面电势的变化,可以分析多晶薄膜晶界和晶粒处的表面功函数的差异。测试结果对于分析多晶半导体薄膜在晶界和晶粒内部的载流子输运及界面钝化具有重要意义。KPFM具有很高的分辨率和灵敏性,很适合用于多晶半导体薄膜表征测试。

     

    Abstract: Kelvin probe force microscope (KPFM) can measure the surface contact potential difference (CPD) between the probe and the sample using Kelvin method. And the surface topography image and CPD can be obtained simultaneously. The CPD of both the as-deposited and annealed CdTe films have been measured by KPFM. High resolution KPFM measurements on CdTe films revealed interesting insights into the subtle variations in CPD at GBs. It is great significant for the analysis of carrier transport at grain boundaries and inside grains and interface passivation of polycrystalline semiconductor thin films. KPFM is an atomic force microscopy based derivative with high resolution. High resolution and subtle sensitivity make it suitable to analyse the nanostructure of polycrystalline semiconductor thin films.

     

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